University of Houston • University of Houston-Clear Lake • ISSO Annual Report Y2003 • 100-101

 

High Intensity, Large Area, Energetic (10-100s of EV) Neutral Beams

Demetre J. Economou [UH]

Publications
Kim, D. and D. J. Economou. "Multidimensional Plasma Sheaths and Resulting Ion/Fast Neutral Distributions at the Substrate Surface," in Proc., Seventh International Symposium on Sputtering and Plasma Processes," ISSP 2003, Kanazawa, Ishikawa, Japan, June 11-13, 2003. 55-62.
Kim, D. and D. J. Economou. "Plasma Molding over Deep Trenches and the Resulting Ion and Energetic Neutral Distributions," J. Vac. Sci. Technol. B 21 (2003): 1248-53.
Kim, D. and D. J. Economou. "Simulation of Plasma Molding over a Ring on a Flat Surface," J. Appl. Phys. 94 (2003): 3740-47.
White, B., Q. Wang, D. J. Economou, P. J. Wolf, T. Jacobs, and J. Fourcher. "Neutral Oxygen Beam Stripping of Photo Resist on Porous Ultra Low-k Materials," Proc., IEEE International Interconnect Technology Conference, San Francisco, CA, June 2-4, 2003. 153.

Presentations
Economou, D. J. and D. Kim. "Multidimensional Plasma Sheaths and Resulting Ion/Fast Neutral Distributions on the Substrate Surface," 50th International Symposium of the American Vacuum Society, Baltimore, MD, Nov. 2-7, 2003.
Economou, D. J., Q. Wang, B. White, P. J. Wolf, T. Jacobs, and J. Fourcher. "Photoresist Removal on Porous Low-k Materials Using a Neutral Oxygen Beam," Wafer Cleaning and Surface Preparation Workshop, International SEMATECH, Austin, TX, May 1-2, 2003.
Economou, D. J., Q. Wang, B. White, P. J. Wolf, T. Jacobs, and J. Fourcher. "Photoresist Removal on Porous Low-k Materials Using an Energetic (100s of eV) Oxygen Neutral Beam," 50th International Symposium of the American Vacuum Society, Baltimore, MD, Nov. 2-7, 2003.
Kim, D. and D. J. Economou. "Plasma Molding Over 2-D Features," Annual Meeting of the American Institute of Chemical Engineers, San Francisco, CA, Nov. 16-21, 2003.
White, B., Q. Wang, D. J. Economou, P. J. Wolf, T. Jacobs, and J. Fourcher. "Neutral Oxygen Beam Stripping of Photo Resist on Porous Ultra Low-k Materials," IEEE International Interconnect Technology Conference, San Francisco, CA, June 2-4, 2003.

Funding and proposals
Economou, D. J. "A New Paradigm in Microelectronics Manufacturing Using Energetic Neutral Beams." UHGEAR, Sept. 2003-Aug. 2004, $18,000.
—. "Resist Cleaning Using Neutral Beams for Advanced Low-k Dielectrics." International SEMATECH, Jan. 2004-Dec. 2004, $25,000.
Economou, D. J. and V. Donnelly. "Energetic (100s of eV) Directional Neutral Beams for Advanced Microelectronics Manufacturing." Texas Advanced Technology Program, Jan. 2003-Dec. 2004, $160,000; UH portion is $80,000.

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Institute for Space Systems Operations - Y2003 Annual Report
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